Past, Present and Future of the Dental Implant Topography

Kim, Young-Taek

doi:2021.59.4.226

J Korean Dent Assoc > Volume 59(4); 2021 > Article

The Journal of The Korean Dental Association 2021;59(4):226-231.
DOI: https://doi.org/10.22974/jkda.2021.59.4.003 Published online March 31, 2021.

치과 임플란트 표면의 과거, 현재, 그리고 미래

김영택

국민건강보험 일산병원 치과 치주과

Past, Present and Future of the Dental Implant Topography

Young-Taek Kim

Department of Periodontology, National Health Insurance Service Ilsan Hospital

Correspondence: Young-Taek Kim, Tel: +82-31-900-0620, Fax: +82-303-3448-7137,
Email: youngtaek@nhimc.or.kr

Abstract

Osseointegration means the interlocking of bone and implant surface. The surface of dental implants played a key role for osseointegration. Commercially pure titanium implants (CPTi) grade 4 implant shows high corrosion resistance and fatigue strength. Most commercial implants use this Titanium and modify the surface with moderate roughness (1~100μm). Moderately roughness offers most effective bone to implant contact and high-est removal torque based on the biological stability. As in the surface roughness, biofilm can be formed easily, peri-implantitis is a next challenge of the implant surface modification. It has been expected to overcome the biological complication of dental implants with the nano technology. However, nano technology has been studied limitedly in the laboratory. The implant surface will be developed with the aim of having fast osseointegration, long-term BIC interlock-ing, and high bacterial resistance.

Key Words: Dental implants; Osseointegration; Titanium; Bone-implant interface